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XQ

Xinping Qu

Microelectronics

Fudan University

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About Xinping Qu at Fudan University

Based at Fudan University, Xinping Qu focuses their scholarly efforts on Semiconductor materials, Copper interconnects, Chemical mechanical polishing, TSV metallization, Device reliability, Interface engineering, Wet etching, Passivation layers, bridging the gap between theory and practice in Semiconductor materials. A representative example of their recent contribution is the study titled "Polydopamine-coated cerium oxide core–shell nanoparticles for efficient and non-damaging chemical–mechanical polishing", which offers critical insights into the dynamics of Semiconductor materials and Copper interconnects. Additional work such as "Low contact resistance copper-copper bonding with selective electroless plating cobalt interlayer" further demonstrates their commitment to advancing knowledge in this domain.

Research Areas

Semiconductor materialsCopper interconnectsChemical mechanical polishingTSV metallizationDevice reliabilityInterface engineeringWet etchingPassivation layers
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Academic Impact Matrix

Research output metrics for Xinping Qu aggregated from public academic databases. Student lab experience data is pending.

Academic data verified · April 2026 · Next sync: May 2026

Research Output

Total Citations10

Emerging researcher

Publications10

Selective publication record

h-index2

Developing track record

Lab Environment

No lab data yet for Xinping Qu

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